Method for patterning a radiation sensitive layer

ABSTRACT

Provided is a process for lithographically patterning a material on a substrate comprising the steps of (a) depositing a radiation sensitive material on the substrate by chemical vapor deposition; (b) selectively exposing the radiation sensitive material to radiation to form a pattern; and (c) developing the pattern using a supercritical fluid (SCF) as a developer. Also disclosed is a microstructure formed by the foregoing process. Also disclosed is a process for lithographically patterning a material on a substrate wherein after steps (a) and (b) above, the pattern is developed using a dry plasma etch. Also disclosed is a microstructure comprising a substrate; and a patterned dielectric layer, wherein the patterned dielectric layer comprises at least one two-dimensional feature having a dimensional tolerance more precise than 7%. Also disclosed is a microelectronic structure comprising a substrate; a plurality of transistors formed on the substrate; and a plurality of conductive features formed within a dielectric pattern, wherein the plurality of conductive features include at least one two-dimensional feature having a dimensional tolerance more precise than 7%.

[0001] This invention was made in the course of research sponsored inpart by the National Science Foundation. The U.S. Government may havecertain rights in this invention.

FIELD OF THE INVENTION

[0002] This invention relates to methods of lithographic patterningusing solvent-free compositions. The invention also relates to directpatterning without resists.

BACKGROUND OF THE INVENTION

[0003] Current lithographic processes employed by the microelectronicsindustry have significant environmental, safety and health (ESH)impacts. The fabrication of semiconductor devices uses photoresist tolithographically define features at every mask level. Advancedcomplementary metal oxide semiconductor (CMOS) and bipolar integratedcircuit (IC) processes can require in excess of twenty-five mask levels.This large number of processing steps results in significant volumes ofchemicals being consumed. Wet solutions are used for the application ofthe photoresist layer and during the development step. Thus, improvedresist processing presents a clear need and an opportunity to reduce theESH impact of microelectronics manufacturing. The present inventionfulfills this and other needs.

SUMMARY OF THE INVENTION

[0004] The present invention relates to a process for lithographicallypatterning a material on a substrate comprising the steps of:

[0005] (a) depositing a radiation sensitive material on the substrate bychemical vapor deposition;

[0006] (b) selectively exposing the radiation sensitive material toradiation to form a pattern; and

[0007] (c) developing the pattern using a supercritical fluid (SCF) as adeveloper.

[0008] The present invention also relates to microstructures formed bythe foregoing process.

[0009] The present invention also relates to a process forlithographically patterning a material on a substrate wherein aftersteps (a) and (b) above, the pattern is developed using a dry plasmaetch.

[0010] The present invention also relates to a microelectronic structurecomprising a substrate; and a patterned dielectric layer, wherein thepatterned dielectric layer comprises at least one two-dimensionalfeature having a dimensional tolerance more precise than 7% of dimensionof the two-dimensional feature.

[0011] The present invention also relates to a microelectronic structurecomprising a substrate; a plurality of transistors formed on thesubstrate; and a plurality of conductive features formed within adielectric pattern, wherein the plurality of conductive features includeat least one two-dimensional feature having a dimensional tolerance moreprecise than 7% of the dimension of the two-dimensional feature.

BRIEF DESCRIPTION OF THE DRAWINGS

[0012]FIG. 1 is a comparison of a conventional process employing asacrificial photosensitive resist layer with one using direct dielectricpatterning.

[0013]FIGS. 2A and 2B show atomic force micrograph of electron-beampatterned fluorocarbon films. FIG. 2A shows the pattern beforedevelopment with supercritical CO₂ and FIG. 2B after development.

DESCRIPTION OF THE SPECIFIC EMBODIMENTS

[0014] Conventional photoresists are applied by spin-on technology.Typically, only a few percent of the material that is dispensed onto thesilicon wafer actually becomes the photoresist layer and the restbecomes waste (1). The waste solution typically contains polymericmatrix material, photosensitive agents and solvents. Thus, spin-onresists result in large volumes of waste material, which require safeand costly disposal. The resist solutions are usually combustible, sothe materials are held at temperatures below their flash point (2).Also, spin-on processes pose potential risks for worker exposure tosolvents. Regulatory constraints on volatile organic chemical (VOC)emissions have motivated efforts to design revolutionary processes (3).Thus the use of vapor deposition processes and the use of supercriticalcarbon dioxide (SCF CO₂) as developer may provide critical alternativesto the present solvent-based approaches.

[0015] After optical exposure, the pattern in a photoresist layer mustbe developed. As critical feature size diminishes, the selectivity andenvironmental friendliness of the solvent used as the developer becomesincreasingly important. Suitable alternative solvents with very highselectivity and adjustable solvating power are therefore required. Theapplication of liquid developers in the mainstream productionenvironment generates enormous waste streams causing great environmentalconcern. These properties are not adequately addressed by the aqueousbase solutions currently in use. Thus again there are potentialopportunities in using such liquids as SCF CO₂, not only forenvironmental reasons but because simple adjustment of pressure and/ortemperature can provide a means of optimizing solvent behavior.

[0016] Environmental and economic driving forces also favor reducing thenumber of processing steps required for IC production. This could beachieved by combining the functionality of photosensitive and lowdielectric constant thin films. Fluoropolymers and organosilicon films(both types of polymers being soluble in SCFl CO₂) have low dielectricconstants and good thermal stability, desirable characteristics forfuture interconnect insulating materials. If the patterned photoresistlayer can be imaged and also satisfy the requirements for low dielectricconstant interlevel dielectric materials, a great number of processingsteps would be eliminated.

[0017] The first step in the present process for lithographicallypatterning a material on a substrate involves depositing a radiationsensitive material on the substrate by chemical vapor deposition (CVD).Thus no organic solvent is used during resist deposition. CVD includespulsed plasma enhanced chemical vapor deposition (PECVD) and pyrolyticCVD as well as continuous PECVD.

[0018] Plasma polymerization is a common method for depositingfluorocarbon and organosilicon thin films (1,2). The fluorocarbonpolymers and organosilicon films comprise the radiation sensitivematerials of the present invention. PECVD uses continuous radiofrequency (rf) power to excite the precursor gases in order to depositfilms within the glow discharge region. The resulting plasma containsions, radicals, excited species and neutrals from which solid coatingsare deposited.

[0019] With pulsed PECVD and pyrolytic CVD methods, the as-depositedfilms are anticipated to have fewer crosslinking sites than theircontinuous PECVD counterparts. Thus, irradiation resulting in theproduction of cross-linking groups can result in dramatic differences inchemical structure. Increasing structural differences between theas-deposited and irradiated films should correlate to higherphotolithographic contrast. In addition, growth rates for the pyrolyticprocesses are very high, which is a desirable feature forcommercialization.

[0020] Pulsed PECVD limits the duration of plasma excitation and thusaffords a degree of control over the reaction pathways available to thefeed gas. The concentrations of species under these dynamic conditionscan be very different than those achieved at steady state. In addition,plasma damage of the growing films by ion bombardment and UV irradiationis reduced. Reasonable film growth rates can be maintained becausedeposition continues after the plasma is extinguished.

[0021] Pyrolytic CVD of fluorocarbon has previously been reported (4).In this process, decomposition of the feed gas occurs over a hotfilament or plate in vacuum, while the growth substrate is maintainedaround room temperature. The pyrolytic process, involves a different,and presumably less complex, reaction network than a plasma process.

[0022] As used herein, the phrase “radiation sensitive material” refersto any polymer, or other film-forming material that becomes a resist orany composition that can be induced to etch, vaporize or ion implant toform a pattern. The term “radiation” includes thermal radiation as wellas photonic radiation, including radiation from particle beam sources(such as electron beam, ion beam) as well as other types ofelectromagnetic radiation.

[0023] In one embodiment, the radiation sensitive material of thepresent invention have low dielectric constants, typically less than3.0. In one embodiment, the dielectric constant ranges from 1.9 to 2.7.

[0024] In one embodiment, the radiation-sensitive material of thisinvention is a fluorocarbon polymer. In one embodiment, the fluorocarbonpolymer of this invention is poly(CF₂) which is made by thepolymerization of the reactive diradical difluorocarbene (:CF₂) (5).Hexafluoropropylene oxide (HFPO) is used as a thermal source of theradical difluorocarbene (:CF₂) (5). While not wishing to be bound bytheory, it is believed that the unimolecular pyrolytic decomposition ofHFPO proceeds according to the following scheme:

[0025] ESH impact of a CVD process can be minimized through the designof the deposition chemistry. This design involves several steps. Thefirst is selection of CVD precursor gases which are as benign aspossible. In addition, known primary reaction pathways of theseprecursors should not result in hazardous effluents. Next, reactorconditions can be found which efficiently react gas to form film. Thesesteps minimize material and energy utilization as well as effluent gasproduction.

[0026] In one embodiment, the radiation sensitive material is anorganosilicon film. The production of organosilicon films by pyrolyticCVD has been previously reported (6). Growth rates of this type of filmdeposition are high (well over 3,000 Å/min). High deposition ratesincrease throughput and reduce cost. Fast growth rates also minimizechemical consumption and effluent.

[0027] The organosilicon films of the present invention includeorganosilanes and organosiloxanes. Examples of organosilanes includewithout limitation tetraethylorthosilicate, diethylsilane,tetramethylsilane and triethyoxysilane. In one preferred embodiment, theorganosilicon film used as the radiation-sensitive material is derivedfrom hexamethylcyclotrisiloxane, octamethylcyclotetrasiloxane or amixture thereof. Polyorganosiloxanes can also be deposited by pyrolyticCVD. Methods of forming a silicon oxide film on a heated substrate bychemical vapor deposition (CVD) using an organosilicon compound gas andoxygen gas are disclosed in U.S. Pat. No. 5,593,741. The use of vapordeposited organosilicon compounds as a dry resist is described in U.S.Pat. No. 5,439,780. The fluoropolymers and organosilicon films of thepresent invention allow for direct dielectric patterning.

[0028] In one embodiment, a photoacid generator is included in the firststep of the present process, namely the depositing of radiationsensitive material on the substrate by CVD. Upon exposure to radiation,the photoacid generator generates an acid. Suitable acid generatorsinclude triflates (e.g., triphenylsulfonium triflate or bis-(t-butylphenyl) iodonium triflate), pyrogallol (e.g., trimesylate ofpyrogallol), onium salts such as triarylsulfonium and diaryl iodoniumhexafluorantimonates, hexafluoroarsenates, trifluoromethane sulfonates,perfluoro alkyl sulfonium iodonium salts, and others;trifluoromethanesulfonate esters of hydroxyimides,alpha-alpha'-bis-sulfonyl diazomethanes, sulfonate esters ofnitro-substituted benzyl alcohols and napthoquinone-4-diazides and alkyldisulfones. Other suitable photoacid generators are disclosed U.S. Pat.Nos. 4,491,628 and 5,071,730.

[0029] The second step of the process involves exposing the radiationsensitive material to radiation to form a pattern. The radiation used toirradiate the radiation sensitive material includes ultravioletradiation, deep ultraviolet radiation, extreme-ultraviolet radiation(soft x-rays), the radiation corresponding to the gap between softx-rays and deep ultraviolet radiation, x-rays, electron beam, and ionbeam radiation. In one embodiment, the wavelength of the deep uvradiation ranges from 120 nm to 450 nm, and in one embodiment 157 mn, inone embodiment 193 nm, and in embodiment 246 nm.

[0030] The third step involves developing the pattern using asupercritical fluid (SCF) as a developer. A SCF is defined as any fluidat a temperature that is greater than its critical temperature and at apressure that is greater than its critical pressure. Photography usingaqueous base development has become the workhorse of the electronicsindustry. Any developer that replaces aqueous base should providesuperior images than possible with today's resist materials. Usingcurrent processes, there has been remarkable progress in theminiaturization of electronic devices over the last 2-3 decades. Thetrend in the electronics industry toward miniaturization and increasedcomplexity of the IC's demands tremendous improvement both in thechemistry of the resists as well as in their processing. This has puttremendous pressure on resist design and developer usage. As targetdimensions continue to decrease, the selectivity of the developerbecomes increasingly important in achieving high-resolution features.Solvents with such selectivity include supercritical fluids (SCF),unusual solvents with many characteristics not found in conventionalliquids. The unique properties of these fluids include liquid-likedensities, gas-like diffusivities and viscosities, negligible surfacetension and pressure adjustable solvating power (7). Suitable examplesof supercritical fluids include carbon dioxide; mixtures of carbondioxide with at least one of butane, pentane, toluene, cyclohexane,acetonitrile, and methanol; 2,3-dimethylbutane; ethanol; n-hexane;propane; propane/water mixtures; sulfur hexafluoride; propane; andethane. In one preferable embodiment, the supercritical fluid issupercritical carbon dioxide (SCF CO₂), owing to its nontoxic,nonflammable nature and very low cost. Using SCF CO₂ as a developereliminates much waste as is involved with using traditional aqueous basedevelopers.

[0031] Along with being an extremely selective solvent, it is consideredto be an “environmentally responsible” solvent both because it is notozone depleting and due in part to its ability to be recycled by simplecompression-decompression steps. Presently, millions of gallons ofwastewater from semiconductor processing facilities are treatedannually. Supercritical solvents offer the possibility of superiordeveloper performance and simpler disposal or recycling with less effortand expenditure of energy than current solvents.

[0032] In one embodiment of the present invention, the step ofdeveloping the pattern is performed using a dry plasma etch, instead ofSCF CO₂. The basic technique of plasma etching will be well known tothose skilled in the art. A glow discharge is used to producedchemically reactive species (atoms, radicals and ions) from a relativelyinert molecular gas. The etching gas is selected so as to generatespecies which react chemically with the material to be etched, and whosereaction product with the etched material is volatile.

[0033] The substrates for the present process include patternablesubstrate such as ceramic materials (such as glass), epoxy materials,plastic materials, semiconductor materials (such as silicon onsemiconductor), silicon wafers, magnetic discs, and printed circuitboards.

[0034] The present process for lithographic patterning encompasses bothdirect dielectric patterning as well as patterning with a resist. Thedirect dielectric patterning process is a resistless process wherein thepatterned layer is used as an imagable dielectric in which the patternedlayer remains as part of the device rather than being a sacrificialresist layer which is stripped away. The conventional patterning processuses the patterned layer as a resist, and this pattern is transferred toan underlying layer by etching and then stripping away the resist. Thusin a conventional process that uses a resist, the substrate comprises anunderlying dielectric layer and a sacrificial resist layer on top of theunderlying dielectric layer. FIG. 1 illustrates the comparison of theconventional process with the direct patterning process. Theconventional scheme employs a sacrificial photoresist layer to patternthe dielectric layer. In the direct dielectric patterning processreduces the number of processing steps by using a photosensitivedielectric. The simplicity of the direct patterning process is favoredby both environmental and economic factors. Also indicated in FIG. 1 aresteps in which the CVD and SCF CO₂ can replace solution-based processes.

[0035] In one embodiment of the present invention, the pattern on thesubstrate formed by the direct dielectric patterning process is superiorto a conventional process that does not use direct dielectricpatterning. This is likely the result of fewer processing steps (seeFIG. 1), and an additional step is likely to introduce addeddistortions. As such, the line geometries, resolution, dimensionaltolerance, and/or the aspect ratio (height/width) of the patterns formedon the substrate are superior to those that be provided by aconventional technique that does not utilize direct dielectricpatterning.

[0036] Thus, in one embodiment, the present invention provides amicrostructure comprising a substrate and a patterned dielectric layerwhich comprises at least one two dimensional feature having adimensional tolerance more precise than 7%, preferably more precise than6%. Furthermore, when scaling a technology, it becomes increasinglydifficult to sustain a constant dimensional tolerance as feature sizesare correspondingly reduced. Hence, it is advantageous to even maintaina dimensional tolerance at a level of 7-8% , as dimensional tolerancetends to worsen (i.e., becomes less precise) with decreasing dimensions.As used herein, “microstructure” includes any structure that can becreated using integrated circuit technology including traditionalelectronic and microelectronic (including microelectromechanical)systems as well as combinations of the two systems. Thus,“microstructure” is inclusive of “microelectronic” structure whichlatter is produced by a microelectronic system. “Dimensional tolerance”here refers to the dimensional precision in production of themicrostructure. Thus, for example, a 180 nm structure having adimensional tolerance of plus or minus 14 nm would have a dimensionaltolerance in percent of (±14/180) times 100 or ±7.78% of the featureddimension. A “more precise” dimensional tolerance (higher precision)indicates a lower percentage number, i.e., lower than 7.78% of thefeatured dimension. While not wishing to be bound by theory, it isbelieved that the better dimensional tolerance and higher aspect ratioof the two dimensional features produced by the direct dielectricpatterning process of the present invention over conventional process isdue to the lower surface tension of SCF CO₂ which does not allow themicrostructures to collapse and topple as readily as microstructuresproduced by the conventional process (which is not a direct dielectricprocess, but where images are transferred through a sacrificial resistlayer as disclosed above). With regard to aspect ratios, it is believedthat the conventional process can yield microstructures with a maximumaspect ratio of (4-5):1. However with direct dielectric patterning onecan obtain microstructures with improved aspect ratios, preferablygreater than 5:1 ratios. Furthermore, when scaling a technology, itbecomes increasingly difficult to sustain a constant aspect ratio fordimensional tolerance as nanoscale structures become increasingly morefragile and more vulnerable to fluid forces and dynamics.

[0037] In one embodiment, the microelectronic structure comprisesconductive features. For example, conductive features such astransistors and metal lines may be formed by metallic deposition withinthe dielectric pattern as part of a process for forming transistors onthe substrate.

[0038] As can be seen from FIG. 1, on the left the conventional processemploys a sacrificial photosensitive resist layer to pattern thedielectric layer. On the right, the number of steps is drasticallyreduced by use of a photosensitive dielectric. Such process simplicityis favored by both environmental and economic factors. The arrows on theright indicate steps in which the CVD and SCF CO₂ can replace solutionbased processes (wet chemistry).

[0039] The present invention also provides for a three-dimensionalstructure formed on a substrate. The three-dimensional structure isformed by a three-dimensional direct patterning process. Currentlithographic processes, such as two photon patterning and holographicimaging enable the transfer of complex three dimensional structures intoa resist film. However, this ability to write three dimensionalstructure in the resist is lost when the image is transferred into theetched substrate, as only a two dimensional mapping is transferredduring the etching process. However, the present invention provides forthe imaging of a three dimensional structure on the substrate, as it isnot limited to a secondary transfer of an image or structure through aresist layer which only allows two-dimensional mapping. Thus the directpatterning process of the present invention allows the formation of athree-dimensional structure on a substrate.

[0040] As mentioned above, a three dimensional imaging technique can beuse to selectively expose a radiation sensitive dielectric material toradiation. Examples of such imaging technique include multi-photonpatterning and holographic imaging.

[0041] The production of three-dimensional sensible objects bymulti-photon patterning is disclosed in U.S. Pat. No. 4,288,861. By“multiphoton”, it is meant to refer to the coincidence or intersectionof at least two beams of electromagnetic radiation at a target locationin a molecule with sufficient incident energy to effect a selectedchange of energy level within the molecule as by photon absorption.

[0042] The use of holographic imaging in lithographic processes is wellknown to those or ordinary skill in the art. Methods for definingthree-dimensional structure of an object using holographic imaging aredisclosed in U.S. Pat. Nos. 5,937,318; 5,910,660 and 5,640,255.

[0043]FIGS. 2A and 2B show atomic force micrograph of electron-beam(e-beam) patterned fluorocarbon films. FIG. 2A shows the patternproduced by e-beam radiation before development with SCF CO₂. The figureshows densification or volatilization. FIG. 2B shows the pattern afterdevelopment with SCF CO₂ and shows substantially removal of the materialdeposited by CVD (which was a fluorocarbon derived fromhexafluoropropylene oxide (HFPO)) from the exposed regions.

[0044] Each of the documents referred to in this application isincorporated herein in its entirety and for all purposes by reference.Unless explicitly indicated to the contrary, all numerical quantities inthis description specifying amounts of materials, number of carbonatoms, and the like, are to be understood as modified by the word“about.”

[0045] While the invention has been explained in relation to itspreferred embodiments, it is to be understood that various modificationsthereof will become apparent to those skilled in the art upon readingthe specification. Therefore, it is to be understood that the inventiondisclosed herein is intended to cover such modifications as fall withinthe scope of the appended claims.

What is claimed is:
 1. A process for lithographically patterning amaterial on a substrate comprising the steps of: (a) depositing aradiation sensitive material on the substrate by chemical vapordeposition; (b) selectively exposing the radiation sensitive material toradiation to form a pattern; and (c) developing the pattern using asupercritical fluid (SCF) as a developer.
 2. The process of claim 1 thatis a direct dielectric patterning process.
 3. The process of claim 1wherein the substrate comprises an underlying dielectric layer and asacrificial resist layer on top of the underlying dielectric layer. 4.The process of claim 1 wherein the radiation sensitive material afterselective exposure to radiation results in a positive-type resist. 5.The process of claim 1 wherein the radiation sensitive material afterselective exposure to radiation results in a negative-type resist. 6.The process of claim 3 further comprising the step of transferring thepattern from the sacrificial resist layer to the underlying dielectriclayer by etching, and stripping away the sacrificial resist layer. 7.The process of claim 1 further comprising the step of: including aphotoacid generator in step (a).
 8. The process of claim 1 wherein thechemical vapor deposition comprises pyrolytic chemical vapor deposition.9. The process of claim 1 wherein the radiation sensitive material hasdielectric constant of less than about 3.0.
 10. The process of claim 1wherein the dielectric constant of the radiation sensitive materialranges from about 1.9 to about 2.7.
 11. The process of claim 1 whereinthe radiation sensitive material is selected from the group consistingof a fluorocarbon and an organosilicon compound.
 12. The process ofclaim 11 wherein the fluorocarbon comprises poly(CF₂).
 13. The processof claim 12 wherein the poly(CF₂) is made by polymerization ofdifluorocarbene (:CF₂).
 14. The process of claim 13 wherein thedifluorocarbene is derived from hexafluoropropylene oxide.
 15. Theprocess of claim 11 wherein the organosilicon compound is selected fromthe group consisting of organosilanes and organosiloxanes.
 16. Theprocess of claim 11 wherein the organosilicon compound is derived fromat least one member selected from the group consisting ofhexamethylcyclotrisiloxane and octamethylcyclotetrasiloxane.
 17. Theprocess of claim 1 wherein the radiation used to form the pattern isselected from the group consisting of deep ultraviolet radiation (DUV),extreme ultraviolet radiation, ultraviolet radiation (JV), and x-raysand ion beam.
 18. The process of claim 1 wherein the radiation used toform the pattern is electron beam radiation.
 19. The process of claim 17wherein the wavelength of the deep ultraviolet radiation is a memberselected from the group consisting of 193 nm and 157 nm.
 20. The processof claim 1 wherein the supercritical fluid (SCF) is supercritical carbondioxide.
 21. The process of claim 1 wherein the supercritical fluid(SCF) is a mixture of carbon dioxide and at least one member selectedfrom the group consisting of propane, butane, 2,3-dimethylbutane,pentane, toluene, n-hexane, cyclohexane, acetonitrile, methanol, andethanol.
 22. The process of claim 1 wherein the substrate is asemiconductor substrate.
 23. The process of claim 1 wherein thesubstrate is a silicon wafer.
 24. The process of claim 1 wherein thesubstrate comprises an epoxy material, a ceramic material, a magneticdisc, or a printed circuit board.
 25. A process for lithographicallypatterning a material on a substrate comprising the steps of: depositinga radiation sensitive material on the substrate by chemical vapordeposition; selectively exposing the radiation sensitive material toradiation to form a pattern; and developing the pattern using a dryplasma etch.
 26. A microstructure formed by a process comprising thesteps of: depositing a radiation sensitive material on a substrate bychemical vapor deposition; selectively exposing the radiation sensitivematerial to radiation to form a pattern; and developing the patternusing a supercritical fluid (SCF) as a developer to form themicrostructure; wherein the process is direct dielectric patterningprocess.
 27. A microstructure comprising: a substrate; and a patterneddielectric layer, wherein the patterned dielectric layer comprises atleast one two-dimensional feature having a dimensional tolerance moreprecise than 7% of the dimension of the two-dimensional feature.
 28. Themicrostructure of claim 27 wherein the patterned dielectric layer isformed by a direct patterning process.
 29. The microstructure of claim28 wherein the direct patterning process comprises depositing aradiation sensitive dielectric material on said substrate andselectively exposing the radiation sensitive dielectric material toradiation.
 30. The microstructure of claim 27, wherein the patterneddielectric layer is formed by a solventless lithographic process. 31.The microstructure of claim 30, wherein the solventless lithographicprocess comprises using a supercritical fluid as a developer.
 32. Amicroelectronic structure comprising: a substrate; at least onetransistor formed on the substrate; and at least one conductivetwo-dimensional feature formed within a dielectric pattern, wherein theconductive two-dimensional feature has a dimensional tolerance moreprecise than 7% of the dimension of the two-dimensional feature.
 33. Themicroelectronic structure of claim 32, wherein the conductive featurefurther includes a plurality of transistors.
 34. The microelectronicstructure of claim 32 wherein the conductive feature comprise at leastone metal line.
 35. A microstructure comprising: a substrate; and athree-dimensional structure formed on the substrate, wherein the threedimensional structure is formed by a three-dimensional direct patterningprocess.
 36. The microstructure of claim 35 wherein thethree-dimensional direct patterning process comprises depositing aradiation sensitive dielectric material on the substrate and selectivelyexposing the radiation sensitive dielectric material to radiation usinga three-dimensional imaging technique.
 37. The microstructure of claim36 wherein the three-dimensional direct patterning process furthercomprises using a supercritical fluid as a developer.
 38. Themicrostructure of claim 36 wherein the three-dimensional imagingtechnique comprises two-photon patterning.
 39. The microstructure ofclaim 36 wherein the three-dimensional imaging technique comprisesholographic imaging.